Congratulations to Dr. Tom Iung, for the succesful defense of his thesis on April 21st. His subject based on “Hafnia-based ferroelectric field-effect transistor stacks: correlations between physical properties and device performances” was conjointly supervised by Nick Barrett (CEA) and Mickael Gros-Jean (STMicroelectronics). The discussions with a highly distinguished international jury were certainly fruitful and they contribute to the future work in our team.